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Product Details:
Payment & Shipping Terms:
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| Purity: | Ta 99.95%(3N5) | Grain Size: | Below 40μm |
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| Flatness: | 0.1mm Or 0.15% Max | Material: | Tantalum |
| Appearance: | Silvery Sold, Bright And Clean | Surface: | Polished |
| Application: | Semiconductor | Delivery Time: | 2-3weeks |
| High Light: | ta targets,tantalum disc |
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Dia 50,76.2, 60,25.4, Thickness 3-4mm,Tantalum Sputtering Targets 99.95% Up, Disc Target, Ready Stock
Commodity: Tantalum Disc Target
Purity: 99.95%up, 3N5 up
Grain Size: regular grain size is 40-100um,other grain sizes can be customized as per requests.
Flatness:≤0.2mm
Surface Roughness:<1.6μm
Available sizes for your choice: dia 50*3mm, 76.2*3mm, 76.2*4mm, 25.4*3mm, 76.2*3.175mm
Packaging: Vacuum plastic package
Application: Coating materials for semiconductors, optics etc.AF, AG film coating.
Chemical Compositions:
Typical Analysis: 99.95%(3N5)
Metallic impurities, ppm max by weight
| Element | Al | Ag | Au | B | Bi | Ca | Cd | Cl | Co | Cr | Cu | Fe |
| Content | 0.2 | 1.0 | 1.0 | 0.1 | 1.0 | 0.1 | 1.0 | 1.0 | 0.05 | 0.25 | 0.75 | 0.4 |
| Element | Ga | Ge | Hf | K | Li | Mg | Mn | Mo | Na | Nb | Ni | P |
| Content | 1.0 | 1.0 | 1.0 | 0.05 | 0.1 | 0.1 | 0.1 | 5.0 | 0.1 | 75 | 0.25 | 1.0 |
| Element | Pb | S | Si | Sn | Th | Ti | V | W | Zn | Zr | Y | U |
| Content | 1.0 | 0.2 | 0.2 | 0.1 | 0.0 | 1.0 | 0.2 | 70.0 | 1.0 | 0.2 | 1.0 | 0.005 |
Non-Metallic impurities, ppm max by weight
| Element | C | H | O | N |
| Content | 100 | 15 | 150 | 100 |
Balance: Tantalum
Description:
Tantalum is featured the third highest melting point 2996℃ and high boiling point 5425℃. It has the characteristics of high temperature resistance, high corrosion resistance, cold machining and good welding performance. Therefore, tantalum is widely used in electronics, semiconductor, chemical, engineering, aviation, aerospace, medical, military industry etc. The application of tantalum will be more and more widely used in more industry with the technology progress and innovation.
Tantalum targets are mainly applied in semiconductor industry and optical coating industry. We manufacture various specifications of tantalum sputtering targets upon the request of customers. The raw material tantalum ingots are smelted through vacuum EB furnace. By wary of unique rolling process, through complicated treatment and accurate annealing temperature and time, we produce different dimensions of the tantalum sputtering targets such as disc targets, rectangular targets and rotary targets. Moreover, we guarantee the tantalum purity is between 99.95% to 99.99% ; the grain size is below 100um, flatness is below 0.2mm and the Surface Roughness is below Ra.1.6μm. The size can be tailored by the customers’ requirements or customized as per drawings. We control our products quality through the raw material source till the whole production line and finally deliver to our customers in order to make sure you purchase our products with stable and same quality each lot.
Furthermore, we are glad to provide you the trade in service. We can recover your used sputtering targets to help you with supplying a same new one with lowest price. You are warmly welcome to tell your ideas or requirements to us in a win-win prospect. For more inquiry and information, please don’t hesitate to contact us at any time. We also expect your visit to our factory to witness our whole infrastructure, technology, products and our team.
Our Strength
Stable raw material supply from Chinese biggest tantalum/niobium hydrometallurgy smelter
Advanced technology and modern management
Quality control from the source
OEM services
Guarantee higher quality with lower price
Advanced equipment
Passed ISO 9001 (2015)
Contact Person: sales
