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Baoji Towin Rare Metals Co.,Ltd
Home ProductsTantalum Sputtering Target

Bright And Clean Tantalum Sputtering Target Grain Size 40-100μM Flatness 0.1mm

China Baoji Towin Rare Metals Co.,Ltd certification
We appreciate your nice services and the perfect sputtering targets Towin supplied. We would like to enter into a long term cooperation with Towin Rare Metals.

—— Simon

Reliable factory providing excellent products and services. The specification and quality exceeds ourexpects. Very good, thanks!

—— Bruno Pascal

Very professional team and advanced equipment. Your price is beautiful and the products are perfect. The performance of niobium sheets and plates performs quite well !

—— James Daniel

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Bright And Clean Tantalum Sputtering Target Grain Size 40-100μM Flatness 0.1mm

Bright And Clean Tantalum Sputtering Target Grain Size 40-100μM Flatness 0.1mm
Bright And Clean Tantalum Sputtering Target Grain Size 40-100μM Flatness 0.1mm

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Product Details:
Place of Origin: CHINA
Brand Name: TOWIN
Certification: ISO9001
Model Number: RO5200
Payment & Shipping Terms:
Minimum Order Quantity: Negotiable
Price: Negotiable
Detailed Product Description
Purity: Ta 99.95%(3N5) Grain Size: 40-100μm
Surface Finish: 16 Rms Max, Or Ra 0.4(RMS64 Or Better) Flatness: 0.1mm Or 0.15% Max
Material: Tantalum Appearance: Silvery Sold, Bright And Clean
Surface: Polished Application: Semiconductor
Packaging: Exporting Fiberboard Box Or Upon Customers’ Requirements Delivery Time: 2-3weeks
High Light:

ta targets


tantalum disc

High PurityTantalum Sputtering Targets 99.95% Up, Disc Target, φ76.2*3mm, Ready Stock​


Commodity: Tantalum Disc Target

Purity: 99.95%up, 3N5 up

Grain Size: regular grain size is 40-100um,other grain sizes can be customized as per requests.


Surface Roughness:<1.6μm

Size: dia76.2*3mm each piece

Packaging: Vacuum plastic package

Application: Coating materials for semiconductors, optics etc.AF, AG film coating.


Chemical Compositions:

Typical Analysis: 99.95%(3N5)

 Metallic impurities, ppm max by weight


Element Al Ag Au B Bi Ca Cd Cl Co Cr Cu Fe
Content 0.2 1.0 1.0 0.1 1.0 0.1 1.0 1.0 0.05 0.25 0.75 0.4
Element Ga Ge Hf K Li Mg Mn Mo Na Nb Ni P
Content 1.0 1.0 1.0 0.05 0.1 0.1 0.1 5.0 0.1 75 0.25 1.0
Element Pb S Si Sn Th Ti V W Zn Zr Y U
Content 1.0 0.2 0.2 0.1 0.0 1.0 0.2 70.0 1.0 0.2 1.0 0.005


Non-Metallic impurities, ppm max by weight

Element C H O N
Content 100 15 150 100


Balance: Tantalum





Tantalum is featured the third highest melting point 2996℃ and high boiling point 5425℃. It has the characteristics of high temperature resistance, high corrosion resistance, cold machining and good welding performance. Therefore, tantalum is widely used in electronics, semiconductor, chemical, engineering, aviation, aerospace, medical, military industry etc. The application of tantalum will be more and more widely used in more industry with the technology progress and innovation.


Tantalum target is mainly applied in semiconductor industry and optical coating industry. We manufacture various specifications of tantalum sputtering targets upon the request of customers. The raw material tantalum ingots are smelted through vacuum EB furnace. By wary of unique rolling process, through complicated treatment and accurate annealing temperature and time, we produce different dimensions of the tantalum sputtering targets such as disc targets, rectangular targets and rotary targets. Moreover, we guarantee the tantalum purity is between 99.95% to 99.99% ; the grain size is below 100um, flatness is below 0.2mm and the Surface Roughness is below Ra.1.6μm. The size can be tailored by the customers’ requirements or customized as per drawings. We control our products quality through the raw material source till the whole production line and finally deliver to our customers in order to make sure you purchase our products with stable and same quality each lot.


Furthermore, we are glad to provide you the trade in service. We can recover your used sputtering targets to help you with supplying a same new one with lowest price. You are warmly welcome to tell your ideas or requirements to us in a win-win prospect. For more inquiry and information, please don’t hesitate to contact us at any time. We also expect your visit to our factory to witness our whole infrastructure, technology, products and our team.



Our Strength


  • More than 20 years’ experience in tantalum /niobium and its alloy smelting and deep processing
  • Stable raw material supply from Chinese biggest tantalum/niobium hydrometallurgy smelter

  • Advanced technology and modern management

  • Quality control from the source

  • OEM services

  • Guarantee higher quality with lower price

  • Advanced equipment

  • Passed ISO 9001 (2015)

  • Trade-in services and used target recovery

Bright And Clean Tantalum Sputtering Target Grain Size 40-100μM Flatness 0.1mm 0 

Contact Details
Baoji Towin Rare Metals Co.,Ltd

Contact Person: sales

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