99.95% Purity Niobium Target for Film Coating Material With Extremly Reduced Impurities

99.95% Purity Niobium Rectangular Target for Film Coating Material

Impurities:

Metallic impurities, ppm max by weight

Non-Metallic impurities, ppm max by weight

Grain Size:

1. Typical size:30-80μm
2. Other grain size available upon request

Flatness : ≤0.2mm

Surface Roughness : <1.6μm

Description:

 Niobium targets are used as coating materials. Its melting point is 2468℃ and boiling point 4742℃. It has the characteristics of high temperature resistance, high corrosion resistance and good ductility. Niobium sputtering target(Nb target) is the main raw material of niobium and its alloy film, which are widely used in color TFT, LCD, panel PC, optical lenses, glass coatings, electronic image, advanced touch screen, flat panel display and surface coating material for energy-saving glasses, information storage, solar cell, chemical corrosive environment and shipping enterprise.

Our production line covers smelting to machining until the finished products. We are good at niobiuim target process and has supplied our targets to Japan, Germany, Taiwan. We are continously innovating our techniques, enhancing the product quality, increasing the target utilization rate and  lowering down the costs of our customers. We are sure to be the best choice for our customers.

Our Strength:

• More than 20 years’ experience in tantalum /niobium and its alloy smelting and deep processing
• Stable raw material supply from Chinese biggest tantalum/niobium hydrometallurgy smelter
• Quality control from the source
• Guarantee higher quality with lower price
• Competitive price among the business peers
• Advanced equipment
• Passed ISO 9001 (2015)
• Full and strict quality control system,