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High Purity Tantalum Material Sputtering Targets Grain Size 30-80 Micron

China Baoji Towin Rare Metals Co.,Ltd certification
We appreciate your nice services and the perfect sputtering targets Towin supplied. We would like to enter into a long term cooperation with Towin Rare Metals.

—— Simon

Reliable factory providing excellent products and services. The specification and quality exceeds ourexpects. Very good, thanks!

—— Bruno Pascal

Very professional team and advanced equipment. Your price is beautiful and the products are perfect. The performance of niobium sheets and plates performs quite well !

—— James Daniel

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High Purity Tantalum Material Sputtering Targets Grain Size 30-80 Micron

High Purity Tantalum Material Sputtering Targets Grain Size 30-80 Micron
High Purity Tantalum Material Sputtering Targets Grain Size 30-80 Micron

Large Image :  High Purity Tantalum Material Sputtering Targets Grain Size 30-80 Micron

Product Details:

Place of Origin: CHINA
Brand Name: TOWIN
Certification: ISO9001
Model Number: RO5200

Payment & Shipping Terms:

Minimum Order Quantity: Negotiable
Price: Negotiable
Detailed Product Description
Purity: Ta 99.95%(3N5) Grain Size: Below 40μm
Flatness: 0.1mm Or 0.15% Max Material: Tantalum
Appearance: Silvery Sold, Bright And Clean Surface: Polished
Application: Semiconductor Delivery Time: 2-3weeks
High Light:

ta targets

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tantalum disc

High PurityTantalum Sputtering Targets 99.95% Up, Disc Target, φ25.4*3mm, Ready Stock Grain Size 30-80micron

 

Commodity: Tantalum Disc Target

Purity: 99.95%up, 3N5 up

Grain Size: regular grain size is 40-100um,other grain sizes can be customized as per requests.

Flatness:≤0.2mm

Surface Roughness:<1.6μm

Size: dia 25.4*3mm each piece

Packaging: Vacuum plastic package

Application: Coating materials for semiconductors, optics etc.AF, AG film coating.

 

Chemical Compositions:

Typical Analysis: 99.95%(3N5)

 Metallic impurities, ppm max by weight

 

Element Al Ag Au B Bi Ca Cd Cl Co Cr Cu Fe
Content 0.2 1.0 1.0 0.1 1.0 0.1 1.0 1.0 0.05 0.25 0.75 0.4
Element Ga Ge Hf K Li Mg Mn Mo Na Nb Ni P
Content 1.0 1.0 1.0 0.05 0.1 0.1 0.1 5.0 0.1 75 0.25 1.0
Element Pb S Si Sn Th Ti V W Zn Zr Y U
Content 1.0 0.2 0.2 0.1 0.0 1.0 0.2 70.0 1.0 0.2 1.0 0.005

 

Non-Metallic impurities, ppm max by weight

Element C H O N
Content 100 15 150 100

 

Balance: Tantalum

 

 

Description:

 

Tantalum is featured the third highest melting point 2996℃ and high boiling point 5425℃. It has the characteristics of high temperature resistance, high corrosion resistance, cold machining and good welding performance. Therefore, tantalum is widely used in electronics, semiconductor, chemical, engineering, aviation, aerospace, medical, military industry etc. The application of tantalum will be more and more widely used in more industry with the technology progress and innovation.

 

Tantalum target is mainly applied in semiconductor industry and optical coating industry. We manufacture various specifications of tantalum sputtering targets upon the request of customers. The raw material tantalum ingots are smelted through vacuum EB furnace. By wary of unique rolling process, through complicated treatment and accurate annealing temperature and time, we produce different dimensions of the tantalum sputtering targets such as disc targets, rectangular targets and rotary targets. Moreover, we guarantee the tantalum purity is between 99.95% to 99.99% ; the grain size is below 100um, flatness is below 0.2mm and the Surface Roughness is below Ra.1.6μm. The size can be tailored by the customers’ requirements or customized as per drawings. We control our products quality through the raw material source till the whole production line and finally deliver to our customers in order to make sure you purchase our products with stable and same quality each lot.

 

Furthermore, we are glad to provide you the trade in service. We can recover your used sputtering targets to help you with supplying a same new one with lowest price. You are warmly welcome to tell your ideas or requirements to us in a win-win prospect. For more inquiry and information, please don’t hesitate to contact us at any time. We also expect your visit to our factory to witness our whole infrastructure, technology, products and our team.

 

 

Our Strength

 

  • More than 20 years’ experience in tantalum /niobium and its alloy smelting and deep processing
  • Stable raw material supply from Chinese biggest tantalum/niobium hydrometallurgy smelter

  • Advanced technology and modern management

  • Quality control from the source

  • OEM services

  • Guarantee higher quality with lower price

  • Advanced equipment

  • Passed ISO 9001 (2015)

  • Trade-in services and used target recovery

High Purity Tantalum Material Sputtering Targets Grain Size 30-80 Micron 0 

Contact Details
Baoji Towin Rare Metals Co.,Ltd

Contact Person: sales

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