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|Material:||Nb Ro4200, RO4210||Purity:||99.95%-99.99%(3N5-4N)|
|Grain Size:||30-80μm||Melting Point:||2468 ℃|
|Boiling Point::||4742 ℃||Manufacturing Standard:||ASTM B393|
Coating Material Niobium Target Size 685.8*127*6.0mm Availabe in Shortest Delivery Time
This size of niobium sputtering target is used as coating materials for leybold sputter machine in semiconductors and optics thin film coating.
Dimension: rectangular target, 685.8*127*6mm
Manufacturing Standard: ASTM B393
Metallic impurities, ppm max by weight
Non-Metallic impurities, ppm max by weight
We manufacture various specifications of niobium targets (Nb targets)upon the request of customers through vacuum EB furnace smelting method. By way of unique rolling process, through complicated treatment and accurate annealing temperature and time, we produce different dimensions of the Nb targets as coating materials such as disc targets, rectangular targets and rotary targets.We produce R04200, R04210 targets which meet ASTM B393 standard and the sizes can be customized as per your provided drawings or dimensions. Our Niobium targets are widely used as Semiconductor, optics and displays coating materials .
We maximize the usage rate of our niobium sputtering target and provide the customers with high quality and cost efficiciency.. To maximizing benefits of our customers, we provide the trade-in service to recover the used Nb target. The customers may spend least money but obtain most utilization of Nb target coating materials.
The strict quality control system also assures our clients with good quality. We inspect the finished products by testing instrument such as XRF inspector, ICP, Scaling Mahine, Mtallographic analysis microscope etc.
We hope to build up a win-win cooperation ralationship with each customer and maximize customers' satisfactory.
We are looking forward to your inquiry.
Contact Person: sales