Payment & Shipping Terms:
|Purity:||Ta 99.95%(3N5)||Grain Size:||Below 100μm|
|Surface Roughness:||Ra Below 1.6μm||Material:||Tantalum Metal|
|Packaging:||Exporting Fiberboard Box Or Upon Customers’ Requirements||Delivery Time:||2-3weeks|
|Shape:||Disc, Round||Manufacturing Standard:||ASTM B708|
rotatable sputtering targets
99.95% 3N5 Purity Tantalum Sputtering Target ,Disc Target , ASTM B708
Tantalum has the characteristics of high temperature resistance, high corrosion resistance, cold machining and good welding performance. Therefore, tantalum is widely used in electronics, semiconductor, chemical, engineering, aviation, aerospace, medical, military industry etc. The application of tantalum will be more and more widely used in more industry with the technology progress and innovation. Tantalum sputtering target is made of pure tantalum metal.which is mainly applied in semiconductor industry and optical coating industry.
We manufacture various specifications of tantalum sputtering targets upon the request of customers from semiconductor industry and optical industry through vacuum EB furnace smelting method. By way of unique rolling process, through complicated treatment and accurate annealing temperature and time, we produce different dimensions of the tantalum sputtering targets such as disc targets, rectangular targets and rotary targets. Moreover, we guarantee the tantalum purity is between 99.95% to 99.99% or higher; the grain size is below 100um, flatness is below 0.2mm and the Surface Roughness is below Ra.1.6μm. The size can be tailored by the customers’ requirements. We control our products quality through the raw material source till the whole production line and finally deliver to our customers in order to make sure you purchase our products with stable and same quality each lot.
We produce R05200, R05400 tantalum targets which meet ASTM B708 standard and we can make targets as per your provided drawings. Taking advantages of our high quality tantalum ingots, advanced equipment, innovative technology, professional team, we tailored your required sputtering targets. You may tell us all your requirements and we dedicated in manufacturing upon your needs.
We devoted ourselves to innovating our techniques, enhancing the product quality, increasing the product utilization rate, lowering down the costs, improve our service to supply our customers’ with higher quality products but lower purchase costs. Once you choose us, you will obtain our stable high quality products, more competitive price than other suppliers and our timely, high efficient services.
More than 20 years’ experiences in tantalum / niobium and its alloy smelting and deep processing, we make sure that we can provide you with the best quality products with competitive price. We have entered a long-term contract with the Chinese biggest tantalum/niobium hydrometallurgy smelter to assure our stable and high quality raw material. The full and strict quality control system throughout the whole production line from the raw material till the products ready for delivery, we reject the unqualified products timely to make sure only qualified products can be received by our customers.
In addition, we offer various kinds of services to our customers such as OEM, forging services, sintering services, laser cutting services, rolling services, milling services, trade in services etc. Please feel free to send our the enquiries as long as you require services.
We have been verified by ISO 9001Quality Management System Authentication
Metallic impurities, ppm max by weight
Non-Metallic impurities, ppm max by weight
Grain Size: Typical size<100μm Grain Size
Other grain size available upon request
Surface Roughness:< Ra 1.6μm
Application: Coating materials for semiconductors
Contact Person: sales