Payment & Shipping Terms:
|Purity:||Ta 99.95%(3N5)||Grain Size::||ASTM 4 Or Finer|
|Surface Roughness:||Ra Below 1.6μm||Diameter Tolerance:||±0.254mm|
|Thickness Tolerance:||±0.05∽±0.254mm||Density:||Highest Possible|
|Manufacturing Standard:||ASTM B708||Electronegativity:||1.5 Pauling|
|Delivery Time:||2-3weeks||Packaging:||Exporting Fiberboard Box Or Upon Customers’ Requirements|
rotatable sputtering targets
99.95% 3N5 Purity Tantalum Sputtering Target , Rotary Target, ASTM B708
Application: Coating materials for semiconductors and optics.
Non-Metallic impurities, ppm max by weight
Tantalum sputtering target is mainly applied in semiconductor industry and optical coating industry. We manufacture various specifications of tantalum sputtering targets upon the request of customers from semiconductor industry and optical industry through vacuum EB furnace smelting method. By way of unique rolling process, through complicated treatment and accurate annealing temperature and time, we produce different dimensions of the tantalum sputtering targets such as disc targets, rectangular targets and rotary targets. Moreover, we guarantee the tantalum purity is between 99.95% to 99.99% or higher; the grain size is below 100um, flatness is below 0.2mm and the Surface Roughness is below Ra.1.6μm. The size can be tailored by the customers’ requirements. We control our products quality through the raw material source till the whole production line and finally deliver to our customers in order to make sure you purchase our products with stable and same quality each lot.
We produce R05200, R05400 targets which meet ASTM B708 standard and we can make targets as per your provided drawings. Taking advantages of our high quality tantalum ingots, advanced equipment, innovative technology, professional team, we tailored your required sputtering targets. You may tell us all your requirements and we dedicated in manufacturing upon your needs.
Contact Person: sales