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Baoji Towin Rare Metals Co.,Ltd
Home ProductsTantalum Sputtering Target

Film Coating Material Tantalum Target 3N5 Min Purity Good Sputtering Performance

China Baoji Towin Rare Metals Co.,Ltd certification
We appreciate your nice services and the perfect sputtering targets Towin supplied. We would like to enter into a long term cooperation with Towin Rare Metals.

—— Simon

Reliable factory providing excellent products and services. The specification and quality exceeds ourexpects. Very good, thanks!

—— Bruno Pascal

Very professional team and advanced equipment. Your price is beautiful and the products are perfect. The performance of niobium sheets and plates performs quite well !

—— James Daniel

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Film Coating Material Tantalum Target 3N5 Min Purity Good Sputtering Performance

Film Coating Material Tantalum Target 3N5 Min Purity Good Sputtering Performance
Film Coating Material Tantalum Target 3N5 Min Purity Good Sputtering Performance

Large Image :  Film Coating Material Tantalum Target 3N5 Min Purity Good Sputtering Performance

Product Details:
Place of Origin: CHINA
Brand Name: TOWIN
Certification: ISO9001
Model Number: RO5200 RO5400
Payment & Shipping Terms:
Minimum Order Quantity: Negotiable
Price: Negotiable
Packaging Details: suitable for exporting or as per request
Delivery Time: 2-3 weeks
Payment Terms: L/C, T/T
Detailed Product Description
Purity: Ta 99.95%(3N5) Backing Plate And Bonding: As Per Requirement
Delivery Time: 2-3weeks Packaging: Exporting Fiberboard Box Or Upon Customers’ Requirements
Property: Heat-resistant, Corrosion Resistant Application: Film Coating Materials For Semiconductor, Optics,
Thickness Tolerance: ±0.05∽±0.254mm Manufacturing Standard: ASTM B708
High Light:

ta targets

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tantalum disc

Film Coating Material 99.95%min 3N5min Purity Tantalum Sputtering Target Rectangular Target , ASTM B708

 

 

Commodity: Tantalum Target, Planar/rectangular target,

Application: Coating materials for semiconductors and optics, packages

 

Grain Size: <100μm (Other grain size available upon request)

Flatness ≤0.2mm

Surface Roughness<1.6μm

 

Impurities: ppm max by weight

 

Element Al Ag Au B Bi Ca Cd Cl Co Cr Cu Fe
Content 0.2 1.0 1.0 0.1 1.0 0.1 1.0 1.0 0.05 0.25 0.75 0.4
Element Ga Ge Hf K Li Mg Mn Mo Na Nb Ni P
Content 1.0 1.0 1.0 0.05 0.1 0.1 0.1 5.0 0.1 75 0.25 1.0
Element Pb S Si Sn Th Ti V W Zn Zr Y U
Content 1.0 0.2 0.2 0.1 0.0 1.0 0.2 70.0 1.0 0.2 1.0 0.005

 

Non-Metallic impurities, ppm max by weight

Element C H O N
Content 100 15 150 100

 

 

Description:

 

Tantalum is featured the third highest melting point 2996℃ and high boiling point 5425℃. It has the characteristics of high temperature resistance, high corrosion resistance, cold machining and good welding performance. Therefore, tantalum is widely used in electronics, semiconductor, chemical, engineering, aviation, aerospace, medical, military industry etc. The application of tantalum will be more and more widely used in more industry with the technology progress and innovation. It can be found in cell phones, laptops, game systems, automotive electronics, light bulbs, satellite components and MRI machines.

 

Tantalum target is mainly applied in semiconductor industry and optical coating industry. We manufacture various specifications of tantalum sputtering targets upon the request of customers. Through vacuum EB furnace smelting method, we get high purity tantalulm ingots with minimum 99.95% Ta content. By wary of unique rolling process, through complicated treatment and accurate annealing temperature and time, we produce different dimensions of the tantalum  planar targets. Moreover, we guarantee the grain size is below 100um, flatness is below 0.2mm and the Surface Roughness is below Ra.1.6μm.

 

The size can be tailored by the customers’ requirements. We control our products quality through the raw material source till the whole production line and finally deliver to our customers in order to make sure you purchase our products with stable and same quality each lot.

 

If you require customization service, you only need to send us your required material, purity, dimension, quantity or a drawing for an inquiry. We will reply you our best quote ASAP.

Film Coating Material Tantalum Target 3N5 Min Purity Good Sputtering Performance 0

 

 

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Contact Person: sales

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