Payment & Shipping Terms:
|Manufacturing Standard:||ASTM B 708||Delivery Time:||2-3weeks|
|Packaging:||Exporting Fiberboard Box Or Upon Customers’ Requirements||Property:||Heat-resistant, Corrosion Resistant|
|Application:||Semiconductor, Optics, Package||Backing Plate And Bonding:||Not Bonded|
|Grain Size:||Below 100μm||Surface Roughness:||Ra Below 1.6μm|
rotatable sputtering targets
ASTM B708 Standard Tantalum Sputtering Target 99.95% 3N5 Purity , Rectangular Target
Tantalum is featured the third highest melting point 2996℃ and high boiling point 5425℃. It has the characteristics of high temperature resistance, high corrosion resistance, cold machining and good welding performance. Therefore, tantalum is widely used in electronics, semiconductor, chemical, engineering, aviation, aerospace, medical, military industry etc. The application of tantalum will be more and more widely used in more industry with the technology progress and innovation.
Tantalum sputtering target is mainly applied in semiconductor industry and optical coating industry. We manufacture various specifications of tantalum sputtering targets upon the request of customers from semiconductor industry and optical industry through vacuum EB furnace smelting method. By way of unique rolling process, through complicated treatment and accurate annealing temperature and time, we produce different dimensions of the tantalum sputtering targets such as disc targets, rectangular targets and rotary targets. Moreover, we guarantee the tantalum purity is between 99.95% to 99.99% or higher; the grain size is below 100um, flatness is below 0.2mm and the Surface Roughness is below Ra.1.6μm. The size can be tailored by the customers’ requirements. We control our products quality through the raw material source till the whole production line and finally deliver to our customers in order to make sure you purchase our products with stable and same quality each lot.
We produce R05200, R05400 targets which meet ASTM B708 standard and we can make targets as per your provided drawings. Taking advantages of our high quality tantalum ingots, advanced equipment, innovative technology, professional team, we tailored your required sputtering targets. You may tell us all your requirements and we dedicated in manufacturing upon your needs.
Application: Coating materials for semiconductors and optics, packages
Ta Typical Analysis: 99.95%(3N5)
Metallic impurities, ppm max by weight
Non-Metallic impurities, ppm max by weight
Grain Size:below 100μm (Other grain size available upon request)
Contact Person: sales