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Baoji Towin Rare Metals Co.,Ltd
Home ProductsTantalum Sputtering Target

Cold Machining Rectangle Ta Target 99.99% Purity For Medical / Military Industry

China Baoji Towin Rare Metals Co.,Ltd certification
We appreciate your nice services and the perfect sputtering targets Towin supplied. We would like to enter into a long term cooperation with Towin Rare Metals.

—— Simon

Reliable factory providing excellent products and services. The specification and quality exceeds ourexpects. Very good, thanks!

—— Bruno Pascal

Very professional team and advanced equipment. Your price is beautiful and the products are perfect. The performance of niobium sheets and plates performs quite well !

—— James Daniel

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Cold Machining Rectangle Ta Target 99.99% Purity For Medical / Military Industry

Cold Machining Rectangle Ta Target 99.99% Purity For Medical / Military Industry
Cold Machining Rectangle Ta Target 99.99% Purity For Medical / Military Industry

Large Image :  Cold Machining Rectangle Ta Target 99.99% Purity For Medical / Military Industry

Product Details:
Place of Origin: CHINA
Brand Name: TOWIN
Certification: ISO9001
Model Number: RO5200
Payment & Shipping Terms:
Minimum Order Quantity: Negotiable
Price: Negotiable
Packaging Details: suitable for exporting or as per request
Delivery Time: 2-3 weeks
Payment Terms: L/C, T/T
Detailed Product Description
Purity: Ta 99.95%(3N5) Material: Tantalum
Manufacturing Standard: ASTM B 708 Delivery Time: 2-3weeks
Packaging: Exporting Fiberboard Box Or Upon Customers’ Requirements Property: Heat-resistant, Corrosion Resistant
Application: Semiconductor, Optics, Package Backing Plate And Bonding: Not Bonded
Grain Size: Below 100μm Surface Roughness: Ra Below 1.6μm
High Light:

ta targets


rotatable sputtering targets

ASTM B708 Standard Tantalum Sputtering Target 99.95% 3N5 Purity , Rectangular Target




Tantalum is featured the third highest melting point 2996℃ and high boiling point 5425℃. It has the characteristics of high temperature resistance, high corrosion resistance, cold machining and good welding performance. Therefore, tantalum is widely used in electronics, semiconductor, chemical, engineering, aviation, aerospace, medical, military industry etc. The application of tantalum will be more and more widely used in more industry with the technology progress and innovation.


Tantalum sputtering target is mainly applied in semiconductor industry and optical coating industry. We manufacture various specifications of tantalum sputtering targets upon the request of customers from semiconductor industry and optical industry through vacuum EB furnace smelting method. By way of unique rolling process, through complicated treatment and accurate annealing temperature and time, we produce different dimensions of the tantalum sputtering targets such as disc targets, rectangular targets and rotary targets. Moreover, we guarantee the tantalum purity is between 99.95% to 99.99% or higher; the grain size is below 100um, flatness is below 0.2mm and the Surface Roughness is below Ra.1.6μm. The size can be tailored by the customers’ requirements. We control our products quality through the raw material source till the whole production line and finally deliver to our customers in order to make sure you purchase our products with stable and same quality each lot.


We produce R05200, R05400 targets which meet ASTM B708 standard and we can make targets as per your provided drawings. Taking advantages of our high quality tantalum ingots, advanced equipment, innovative technology, professional team, we tailored your required sputtering targets. You may tell us all your requirements and we dedicated in manufacturing upon your needs.


Our Strength


  • More than 20 years’ experience in tantalum /niobium and its alloy smelting and deep processing
  • Stable raw material supply from Chinese biggest tantalum/niobium hydrometallurgy smelter
  • Quality control from the source
  • Guarantee higher quality with lower price
  • Competitive price among the business peers
  • Advanced equipment
  • Passed ISO 9001 (2015)
  • Full and strict quality control system,


Application: Coating materials for semiconductors and optics, packages



Ta Typical Analysis: 99.95%(3N5)

Metallic impurities, ppm max by weight

Element Al Ag Au B Bi Ca Cd Cl Co Cr Cu Fe
Content 0.2 1.0 1.0 0.1 1.0 0.1 1.0 1.0 0.05 0.25 0.75 0.4
Element Ga Ge Hf K Li Mg Mn Mo Na Nb Ni P
Content 1.0 1.0 1.0 0.05 0.1 0.1 0.1 5.0 0.1 75 0.25 1.0
Element Pb S Si Sn Th Ti V W Zn Zr Y U
Content 1.0 0.2 0.2 0.1 0.0 1.0 0.2 70.0 1.0 0.2 1.0 0.005


Non-Metallic impurities, ppm max by weight

Element C H O N
Content 100 15 150 100


Grain Size:below 100μm (Other grain size available upon request)

Flatness ≤0.2mm

Surface Roughness<1.6μm

Thickness tolerance:±0.05∽±0.254mm


Contact Details
Baoji Towin Rare Metals Co.,Ltd

Contact Person: sales

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